The customer required a heater head for thin film research on a 300mm wafer, incorporating multi-zone heating to achieve a high level of temperature uniformity across the wafer surface. The heater also needed to be compatible with the aggressive process gases used in transition metal dichalcogenide (TMD) chemical vapour deposition (CVD), ensuring reliable operation in a demanding processing environment.
Thermic Edge developed a bespoke heater stage incorporating a three-zone graphite heating element protected by our high-purity SiC³ (silicon carbide) coating. The multi-zone configuration was designed to provide precise temperature control & high uniformity across the 300mm wafer, while offering protection against the aggressive process gases used in thin film deposition.
The assembly incorporated a TiC³ (titanium carbide) coated sample plate, an eight-pin sample lifting mechanism, 200mm of vertical Z-shift, sample rotation & RF biasing capability. Integrated water cooling provided additional thermal management during operation.
The heater stage was designed to meet the following performance specifications:
Maximum top plate temperature: 950°C
Heating ramp rate: 50°C per minute or greater
Cool-down time: 1 hour & 30 minutes
Heating configuration: Three independently controlled zones
Sample handling: Eight lifting pins, 200mm Z-shift & rotation
Additional capabilities: RF sample biasing & water cooling
The completed assembly was used in the production of molybdenum disulphide (MoS₂) & tungsten disulphide (WS₂) thin films, providing the heating, sample manipulation & process compatibility required for TMD chemical vapour deposition research.
Discover our range of heater stages, available configurations & bespoke solutions for your process requirements.
The Thermic Edge team travelled to Taiwan to support the integration of the bespoke heater stage into the customer’s semiconductor research laboratory. Working closely with the customer, we carried out testing to ensure the heater stage performed as intended & met the requirements of their research application.
The visit provided a valuable opportunity to work directly with the customer’s team, address any questions & ensure a smooth handover of the equipment. It was a pleasure to collaborate with the customer throughout the project, from the initial requirements through to final testing, helping to ensure a seamless transition into their research environment.
Download our Heater Stages Overview for more information about our range and options available. Also you can begin your enquiry via our contact page.
The customer required a heater head for thin film research on a 300mm wafer, incorporating multi-zone heating to achieve a high level of temperature uniformity across the wafer surface. The heater also needed to be compatible with the aggressive process gases used in transition metal dichalcogenide (TMD) chemical vapour deposition (CVD), ensuring reliable operation in a demanding processing environment.
Thermic Edge developed a bespoke heater stage incorporating a three-zone graphite heating element protected by our high-purity SiC³ (silicon carbide) coating. The multi-zone configuration was designed to provide precise temperature control & high uniformity across the 300mm wafer, while offering protection against the aggressive process gases used in thin film deposition.
The assembly incorporated a TiC³ (titanium carbide) coated sample plate, an eight-pin sample lifting mechanism, 200mm of vertical Z-shift, sample rotation & RF biasing capability. Integrated water cooling provided additional thermal management during operation.
The heater stage was designed to meet the following performance specifications:
Maximum top plate temperature: 950°C
Heating ramp rate: 50°C per minute or greater
Cool-down time: 1 hour & 30 minutes
Heating configuration: Three independently controlled zones
Sample handling: Eight lifting pins, 200mm Z-shift & rotation
Additional capabilities: RF sample biasing & water cooling
The completed assembly was used in the production of molybdenum disulphide (MoS₂) & tungsten disulphide (WS₂) thin films, providing the heating, sample manipulation & process compatibility required for TMD chemical vapour deposition research.
Discover our range of heater stages, available configurations & bespoke solutions for your process requirements.
The Thermic Edge team travelled to Taiwan to support the integration of the bespoke heater stage into the customer’s semiconductor research laboratory. Working closely with the customer, we carried out testing to ensure the heater stage performed as intended & met the requirements of their research application.
The visit provided a valuable opportunity to work directly with the customer’s team, address any questions & ensure a smooth handover of the equipment. It was a pleasure to collaborate with the customer throughout the project, from the initial requirements through to final testing, helping to ensure a seamless transition into their research environment.
Download our Heater Stages Overview for more information about our range and options available. Also you can begin your enquiry via our contact page.
