Written by Joshua Burgess, Technical Sales Manager. Published: 16th January 2025.
Deposition Stages – An Introduction
Heater stages, also known as deposition stages or substrate heater stages, are integral components in thin-film deposition processes such as Chemical Vapour Deposition (CVD), Physical Vapour Deposition (PVD), and Molecular Beam Epitaxy (MBE). These deposition stages provide precise temperature control and substrate manipulation, which are essential for achieving high-quality thin films with desired properties.
Functions of Heater Stages in Deposition Processes:
Substrate Heating:
Maintaining the substrate at an optimal temperature is crucial for controlling film growth rates, crystallinity, and adhesion. Deposition stages ensure uniform temperature distribution across the substrate, promoting consistent film characteristics.
Temperature Ramp-Up and Cool-Down:
Rapid heating and cooling capabilities allow for efficient processing and reduced cycle times. Thermic Edge’s versatile heaters, for instance, feature high power density for fast ramp-up times and low-mass bodies to minimize cool-down durations.
Substrate Manipulation:
Advanced heater stages offer functionalities such as rotation, tilt, and translation, enabling precise control over film uniformity and thickness. These manipulations can enhance deposition coverage and improve film quality.
Environmental Compatibility:
Heater stages are designed to operate under various conditions, including high vacuum (HV), ultra-high vacuum (UHV), and reactive atmospheres like oxygen-rich environments. This versatility ensures compatibility with a wide range of deposition techniques and materials.
Thermic Edge’s Versatile Heater Solutions:
Thermic Edge offers a range of customizable sample heaters tailored for diverse deposition applications. Key features include:
- Material Options: Thermic Edge’s Heaters are constructed using materials such as Inconel, carbon-carbon composite (CCC), pure silicon carbide (SiC³) CVD coated graphite, Molybdenum and Tungsten catering to different temperature requirements and chemical environments. Our silicon carbide heaters are ideal for processes using corrosive or oxidising compounds usually found in CVD and PVD techniques.
- Size Variability: Standard hot zone sizes range from 2 inches (51 mm) to 8 inches and non-standard newly developed heaters up to 14 inch (356 mm) in diameter, accommodating various substrate dimensions.
- Customization: Optional features like water cooling, sample rotation, manipulation and diverse mounting configurations allow for integration into specific deposition systems and processes. RF cleaning of the substrate holder is also available for all heaters where purity is of high importance for achieving ultra-clean surfaces.
- Performance Efficiency: Designed for fast ramping and efficient operation, these heaters contribute to reduced processing times and increased uniformity across sample area for controlling the growth of the desired film.
Partner with Thermic Edge Ltd:
Whether you’re optimising PVD, CVD, or any other deposition process, our products are designed to meet the most rigorous industry standards. From vacuum heater stages and furnaces to custom components, we provide tailored solutions for your needs.
For further information or to discuss your requirements, please contact us at sales@thermic-edge.com. Our team is ready to help you enhance your deposition processes with the best in vacuum technology.
